ENERGi® demonstrates improved cell performance and the lowest manufacturing cost per watt. Solar cells manufactured using ion implant are usually higher in efficiency by 0.1% to 0.3%. Process flow is simplified due to single-sided doping and elimination of the acid glass etch. Implant provides PID resistant cells (in modules) without additional costs.
- Faster emitter formation
- Better uniformity and repeatability than with diffusion furnaces, resulting in a narrower ETA distribution
- Full amorphization through simple defect formation close to the wafer surface
- Full recrystallization of annealing process through solid phase epitaxial regrowth (SPER), leaving no defects
With more complex flows (PERC, N-type bifacial, TOPCon, HJT, IBC), solar cell manufacturing greatly benefits from ion implant and the improved doping control it provides. This control has improved cell efficiencies to 23%.