The MDP-250B enjoys the largest install base of sputtering equipment in the world.
The system has 12 process stations that are separately vacuum pumped and vacuum isolated. It has a number of process station options, including multiple options for the sputtering of thin-films and carbon overcoats, heating stations, cooling stations and cleaning stations. Furthermore, the MDP-250B’s 12 process stations can be easily reconfigured to accommodate process changes.
The MDP-250B processes disks at more than 550 disks per hour. The system design enables simultaneous dual-sided deposition, single-disk processing for optimum control and disk-to-disk uniformity.
The all-vertical substrate handling provides excellent process and particle performance.
