Crystalline Silicon

TCO:

Transparent Conducting Oxides such as ITO and ZnO can be deposited using a PVD sputter approach on Lean Solar™ for applications on crystalline silicon solar cells such as Hetero-junction solar cells

Metals:

Metallic layers are deposited through PVD sputter processing using Lean Solar™, typically for contact formation and reflector layers on c-Si Solar cells. Metals deposition capability is broad with Lean Solar and can be integrated in stack layers. Capability includes, but is not limited to: Aluminum (Al), Titanium (Ti), Nickel Vanadium (NiV), Copper (Cu) and Molybdenum (Mo).

Etch:

Dry Plasma Etching using RIE Reactive Ion Etch and Decoupled Plasma Sources can be used to etch silicon for dry texture etching as well as patterned contact etch with shadow masks

ARC / Passivation:

The anti-reflective coating layer serves several important functions on a c-Si solar cell. The ARC provides an optical match to the ambient to increase light transmission to the cell, passivates the surface to reduce surface recombination and provides hydrogen which diffuses into the cell to passivate dangling bonds, thereby reducing surface and bulk recombination